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Characterization of two distant double-slits by chaotic light second-order interference

机译:用混沌光刻画两个遥远的双缝   二阶干扰

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摘要

We present the experimental characterization of two distant double-slit masksilluminated by chaotic light, in the absence of first-order imaging andinterference. The scheme exploits second-order interference of lightpropagating through two indistinguishable pairs of {\it disjoint} optical pathspassing through the masks of interest. The proposed technique leads to a deeperunderstanding of biphoton interference and coherence, and opens the way to thedevelopment of novel schemes for retrieving information on the relativeposition and the spatial structure of distant objects, which is of interest inremote sensing, biomedical imaging, as well as monitoring of laser ablation,when first-order imaging and interference are not feasible.
机译:我们提出了在没有一阶成像和干涉的情况下,两个被混沌光照射的双缝口罩的实验特性。该方案利用了通过两对不可区分的{不相交}光路穿过感兴趣的掩模传播的光的二阶干涉。所提出的技术导致对双光子干扰和相干性的更深层次的理解,并为开发用于检索远距离物体的相对位置和空间结构的信息的新方案开辟了道路,这在远程感测,生物医学成像以及监测中都非常有用。激光烧蚀,一阶成像和干涉不可行时。

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